Barrier Formation on a YBa2Cu3Oy Thin Film Using CF4 Plasma Fluorination-中国期刊网

摘要 WeinvestigatethesurfacestructureandcompositionofaYBa2Cu3Oy(YCO)thinfilmodifiedbyCF4plasmafluorination.Inadditiontotheabsorptionofhydrocarbons,chemicalreactionsoftheYBCOsurfacetakeplaceduringCF4plasmatreatment.Variousx-rayphotoelectronspectroscopicdataarereportedanddiscussed.Theexistenceofathinbarrierisconfirmed,whichhomogeneouslycoverstheedgeofthebaseYBCOfilminourinterfaceengineeringJosephsonjunction.MeasurementsofAugerelectronspectroscopicdataandtheresistanceversustemperatureindicatethatthebarrierisacontrollable-insulatinglayer.

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Barrier Formation on a YBa2Cu3Oy Thin Film Using CF4 Plasma Fluorination

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Barrier Formation on a YBa2Cu3Oy Thin Film Using CF4 Plasma Fluorination

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